Sidewall angle tuning in focused electron beam-induced processing

• Sangeetha Hari,
• Willem F. van Dorp,
• Johannes J. L. Mulders,
• Piet H. F. Trompenaars,
• Pieter Kruit and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2024, 15, 447–456, doi:10.3762/bjnano.15.40

• challenging task, some models were developed [21][22], starting from the continuum model for FEBID [23]. But the etching process unfortunately is not quite as straightforward as the deposition process. For instance, the etching rates are difficult to model when the rate limiting factor is determined by the

Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO₂ substrates

• Aleksandra Szkudlarek,
• Jan M. Michalik,
• Inés Serrano-Esparza,
• Zdeněk Nováček,
• Veronika Novotná,
• Piotr Ozga,
• Czesław Kapusta and
• José María De Teresa

Beilstein J. Nanotechnol. 2024, 15, 190–198, doi:10.3762/bjnano.15.18

• deposit, and at a current of 245 pA (higher electron flux) the indent shape. This controllable switching between the hydrocarbons pinning and etching caused by increasing electron flux was explained using the continuum model. The model is based on the dissociation process of adsorbed molecules by

Nanomechanics of few-layer materials: do individual layers slide upon folding?

• Ronaldo J. C. Batista,
• Rafael F. Dias,
• Ana P. M. Barboza,
• Alan B. de Oliveira,
• Taise M. Manhabosco,
• Thiago R. Gomes-Silva,
• Matheus J. S. Matos,
• Andreij C. Gadelha,
• Cassiano Rabelo,
• Luiz G. L. Cançado,
• Ado Jorio,
• Hélio Chacham and
• Bernardo R. A. Neves

Beilstein J. Nanotechnol. 2020, 11, 1801–1808, doi:10.3762/bjnano.11.162

• material where it folds over itself during the exfoliation process. Our method is based on AFM measurements of the geometry and mechanical response of folded edges, and on the fitting of the experimental data by an analytical continuum model parameterized solely by α, κ, and the total thickness d of the

• curve R0 = ahb, where b = 1.75 and a = 0.38 (m−3/4). To obtain κ and α from the AFM data, we propose a variational continuum model (see Supporting Information File 1, section “Deposited folded edges”) for the folded edges with the geometry depicted in Figure 2. This figure shows both cross-section

• )/2 and d0 = d − h, are parameters for the proposed continuum model. Carbon atom positions (gray circles) in cross sections of folded edges in (a) monolayer graphene and (b) three-layered graphene, as obtained through MD simulations. In both panels the red and black lines that superimpose the atomic

Self-assembly and spectroscopic fingerprints of photoactive pyrenyl tectons on hBN/Cu(111)

• Domenik M. Zimmermann,
• Knud Seufert,
• Luka Ðorđević,
• Tobias Hoh,
• Sushobhan Joshi,
• Tomas Marangoni,
• Davide Bonifazi and
• Willi Auwärter

Beilstein J. Nanotechnol. 2020, 11, 1470–1483, doi:10.3762/bjnano.11.130

• polarizable continuum model (CPCM) was used to introduce nonspecific solvation effects. The spectra were generated either with GaussView 5 [94] or GaussSum [95], assuming a half-width of 0.15 eV for proper simulation. The IP and EA were determined as the vertical energy difference between the neutral molecule

Charged particle single nanometre manufacturing

• Philip D. Prewett,
• Cornelis W. Hagen,
• Claudia Lenk,
• Steve Lenk,
• Marcus Kaestner,
• Tzvetan Ivanov,
• Ahmad Ahmad,
• Ivo W. Rangelow,
• Xiaoqing Shi,
• Stuart A. Boden,
• Alex P. G. Robinson,
• Dongxu Yang,
• Sangeetha Hari,
• Marijke Scotuzzi and
• Ejaz Huq

Beilstein J. Nanotechnol. 2018, 9, 2855–2882, doi:10.3762/bjnano.9.266

• parameters and proposed a two-step mechanism governing the process. A more general continuum model incorporating the electron profile, precursor adsorption, diffusion and secondary reactions involving the etch product is presented in [96] to explain experimentally observed etch profiles in terms of the

Chemistry for electron-induced nanofabrication

• Petra Swiderek,
• Hubertus Marbach and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2018, 9, 1317–1320, doi:10.3762/bjnano.9.124

• and transport phenomena. The previously developed continuum model describes the precursor adsorption equilibrium and surface diffusion as well as depletion by electron-initiated fragmentation and can thus predict the shape of a deposit. In this Thematic Series, an extension of this model is described

Thermoelectric current in topological insulator nanowires with impurities

• Sigurdur I. Erlingsson,
• Jens H. Bardarson and
• Andrei Manolescu

Beilstein J. Nanotechnol. 2018, 9, 1156–1161, doi:10.3762/bjnano.9.107

• maximizes the region showing linear dispersion. This condition is fulfilled when For zero magnetic field we choose the lattice parameter a = 0.02 R, which ensures that the first ten states calculated via the lattice model with the λ2 term deviate by less than 1% from those obtained with the continuum model

Correction: Modelling focused electron beam induced deposition beyond Langmuir adsorption

• Dédalo Sanz-Hernández and
• Amalio Fernández-Pacheco

Beilstein J. Nanotechnol. 2017, 8, 2591–2591, doi:10.3762/bjnano.8.259

• Dedalo Sanz-Hernandez Amalio Fernandez-Pacheco Cavendish Laboratory, University of Cambridge, JJ Thomson Cambridge, CB3 0HE, United Kingdom 10.3762/bjnano.8.259 Keywords: adsorption isotherm theory; BET model; continuum model; focused electron beam induced deposition; 3D nanoprinting; Langmuir

Modelling focused electron beam induced deposition beyond Langmuir adsorption

• Dédalo Sanz-Hernández and
• Amalio Fernández-Pacheco

Beilstein J. Nanotechnol. 2017, 8, 2151–2161, doi:10.3762/bjnano.8.214

• Dedalo Sanz-Hernandez Amalio Fernandez-Pacheco Cavendish Laboratory, University of Cambridge, JJ Thomson Cambridge, CB3 0HE, United Kingdom 10.3762/bjnano.8.214 Abstract In this work, the continuum model for focused electron beam induced deposition (FEBID) is generalized to account for multilayer

• types of growth regimes are possible for FEBID under no diffusion, resulting into four types of adsorption isotherms. We propose the use of these maps as a powerful tool for the analysis of FEBID processes. Keywords: adsorption isotherm theory; BET model; continuum model; focused electron beam induced

• model to simulate gas flow surface distribution when delivered from an injector [24], code that analytically and numerically solves FEBID continuum models [25], a hybrid Monte Carlo-continuum model to predict and guide the growth of 3D nanostructures [26], and a molecular dynamics model to give an

3D continuum phonon model for group-IV 2D materials

• Morten Willatzen,
• Lok C. Lew Yan Voon,
• Appala Naidu Gandi and
• Udo Schwingenschlögl

Beilstein J. Nanotechnol. 2017, 8, 1345–1356, doi:10.3762/bjnano.8.136

• , King Abdullah University of Science and Technology, Thuwal 23955-6900, Kingdom of Saudi Arabia 10.3762/bjnano.8.136 Abstract A general three-dimensional continuum model of phonons in two-dimensional materials is developed. Our first-principles derivation includes full consideration of the lattice

• either failed to recognize it [8] or were unable to explain it [1]. An alternative model of lattice vibrations is a classical continuum model, which is expected to reproduce most accurately phonons with wavelengths longer than lattice separations, i.e., near k = 0. One of the earliest such models applied

• different reconstruction state. The reconstruction is an atomic-scale distinction that is not describable by the current continuum model. Substrate effects on the phonons can be considered in an extended model that would need to be solved numerically. This can be studied in a future publication as it is

Modeling of the growth of GaAs–AlGaAs core–shell nanowires

• Qian Zhang,
• Peter W. Voorhees and
• Stephen H. Davis

Beilstein J. Nanotechnol. 2017, 8, 506–513, doi:10.3762/bjnano.8.54

• = π/6 in this six-fold symmetric configuration). Here, v{112} and v{110} are the normal velocities of the corresponding facets due to diffusion of the surface atoms. This fully faceted model without deposition flux was first proposed by Carter and co-workers [9]. The derivation for the continuum model

Association of aescin with β- and γ-cyclodextrins studied by DFT calculations and spectroscopic methods

• Ana I. Ramos,
• Pedro D. Vaz,
• Susana S. Braga and
• Artur M. S. Silva

Beilstein J. Nanotechnol. 2017, 8, 348–357, doi:10.3762/bjnano.8.37

• , dispersion correction and solvent continuum model, an improved basis set – 6-311G(d,p) – on the geometries optimised previously at the M06-2X/6-31g(d) level. For comparison purposes the same calculations were accomplished with both the M06-2X and the B3LYP hybrid functional, but without the D3 or solvation

The difference in the thermal conductivity of nanofluids measured by different methods and its rationalization

• Aparna Zagabathuni,
• Sudipto Ghosh and
• Shyamal Kumar Pabi

Beilstein J. Nanotechnol. 2016, 7, 2037–2044, doi:10.3762/bjnano.7.194

• will move like large molecules within smaller molecules. Meso-continuum model to estimate heat pickup by nanoparticles from the heat source To predict the heat pickup of the nanoparticle during its collision with the heat source a 2D meso-continuum model has been developed. The software package FLUENT

Morphology of SiO₂ films as a key factor in alignment of liquid crystals with negative dielectric anisotropy

• Volodymyr Tkachenko,
• Antigone Marino,
• Eva Otón,
• Noureddine Bennis and
• Josè Manuel Otón

Beilstein J. Nanotechnol. 2016, 7, 1743–1748, doi:10.3762/bjnano.7.167

• , such as a ballistic shadowing model giving the so-called "cosine rule" [11], a continuum model taking surface diffusion into account [12], and a model that accounts for the tendency of the columns to fan out during deposition [13]. The analytical formulas obtained within these models provide a first

Nanoscale rippling on polymer surfaces induced by AFM manipulation

• Mario D’Acunto,
• Franco Dinelli and
• Pasqualantonio Pingue

Beilstein J. Nanotechnol. 2015, 6, 2278–2289, doi:10.3762/bjnano.6.234

• evolution in single scratch tests. In this model, the atomic structure of the substrate is not considered. This makes the continuum model more suitable for polymeric materials that are amorphous and have fully entangled molecules, i.e., for Mw >> Mc. They have also introduced an indentation rate N, varying

Continuum models of focused electron beam induced processing

• Milos Toth,
• Charlene Lobo,
• Vinzenz Friedli,
• Aleksandra Szkudlarek and
• Ivo Utke

Beilstein J. Nanotechnol. 2015, 6, 1518–1540, doi:10.3762/bjnano.6.157

• continuum FEBIP models. Keywords: continuum model; deposition; electron beam processing; etching; gas injection system; Review Introduction to continuum models of focused electron beam induced processing (FEBIP) Continuum FEBIP models enable the simulation of process rates that govern focused electron

• underlying continuum FEBIP models (recent general reviews of FEBIP can be found in [4][10][18][19][20][21]). We begin with a discussion of the reaction rate limited regime and the most common continuum model input parameters: initial adsorbate coverage, electron flux profile and the gas flux distribution

From lithium to sodium: cell chemistry of room temperature sodium–air and sodium–sulfur batteries

• Philipp Adelhelm,
• Pascal Hartmann,
• Conrad L. Bender,
• Martin Busche,
• Christine Eufinger and
• Juergen Janek

Beilstein J. Nanotechnol. 2015, 6, 1016–1055, doi:10.3762/bjnano.6.105

On the structure of grain/interphase boundaries and interfaces

• K. Anantha Padmanabhan and
• Herbert Gleiter

Beilstein J. Nanotechnol. 2014, 5, 1603–1615, doi:10.3762/bjnano.5.172

• curve-fitting exercise. Therefore, a stochastic model was not developed. However, it is important to note that for understanding other properties, the structural element of interest may have to be represented as a combination of more than one “representative volume”. This is a continuum model. But, an

DFT study of binding and electron transfer from colorless aromatic pollutants to a TiO₂ nanocluster: Application to photocatalytic degradation under visible light irradiation

• Corneliu I. Oprea,
• Petre Panait and
• Mihai A. Gîrţu

Beilstein J. Nanotechnol. 2014, 5, 1016–1030, doi:10.3762/bjnano.5.115

• of vibrational analyses. Time-dependent DFT [37] calculations of the molecular orbitals and the electronic transitions were performed in water by means of the polarizable continuum model (PCM) [38][39]. We used the same B3LYP functional and TZVP basis sets [36]. In the case of the pollutants adsorbed

CoPc and CoPcF₁₆ on gold: Site-specific charge-transfer processes

• Fotini Petraki,
• Heiko Peisert,
• Johannes Uihlein,
• Umut Aygül and
• Thomas Chassé

Beilstein J. Nanotechnol. 2014, 5, 524–531, doi:10.3762/bjnano.5.61

• the interface is plotted in Figure 3. Up to 5.5 nm a change of α΄of about 0.7 eV (+/− 0.2 eV) occurs, which corresponds to ΔRD = 0.35 eV (+/− 0.1 eV). According to a previous study, where a dielectric continuum model for ZnPcF16 was applied [19], such values of the relaxation energy are reasonable for

Single-asperity contact mechanics with positive and negative work of adhesion: Influence of finite-range interactions and a continuum description for the squeeze-out of wetting fluids

• Martin H. Müser

Beilstein J. Nanotechnol. 2014, 5, 419–437, doi:10.3762/bjnano.5.50

• constraints. This constitutes a continuum model for a contact immersed in a strongly wetting fluid, which can only be squeezed out in the center of the contact through a sufficiently large normal load FN. As for positive work of adhesion, two stable solutions can coexist in a finite range of normal loads. The

• pull-off Fp force for attractive surfaces, which only varies between 1.5π and 2π in the present unit system. Since the increase of both Fsw and Fsq is much faster in the exponential model than in the Gauss model, one can conclude that the exponential model converges more quickly to the continuum model

Digging gold: keV He⁺ ion interaction with Au

• Vasilisa Veligura,
• Gregor Hlawacek,
• Robin P. Berkelaar,
• Raoul van Gastel,
• Harold J. W. Zandvliet and
• Bene Poelsema

Beilstein J. Nanotechnol. 2013, 4, 453–460, doi:10.3762/bjnano.4.53

• , sputter erosion and atom deposition are similar processes. A continuum model for the mound formation in molecular beam epitaxy (MBE) predicts a coarsening exponent of 0.25 [21], which is very close to the measured values. The pattern exhibits a preferential orientation along the direction (Figure 2d and

Focused electron beam induced deposition: A perspective

• Michael Huth,
• Fabrizio Porrati,
• Christian Schwalb,
• Marcel Winhold,
• Roland Sachser,
• Maja Dukic,
• Jonathan Adams and
• Georg Fantner

Beilstein J. Nanotechnol. 2012, 3, 597–619, doi:10.3762/bjnano.3.70

• independently controlled, is analyzed within a continuum model of FEBID that employs rate equations. Predictions are made for the tunability of the composition of the Co–Pt system by simply changing the dwell time of the electron beam during the writing process. The charge-transport regimes of nanogranular

• ]. Single precursor species continuum model of FEBID The single precursor species continuum model of FEBID assumes a weak precursor–substrate interaction of the van der Waals type and relies on a Langmuir adsorption description neglecting possible interactions between the adsorbed precursor molecules. The

• composition by variation of the dwell time can be devised. In the next subsection the continuum model will therefore be extended to a multicomponent variant. Multicomponent extension of the continuum model The extension of the model described above to the multicomponent case was first introduced by Lobo and

Modeling noncontact atomic force microscopy resolution on corrugated surfaces

• Kristen M. Burson,
• Mahito Yamamoto and
• William G. Cullen

Beilstein J. Nanotechnol. 2012, 3, 230–237, doi:10.3762/bjnano.3.26

• modeling of tip–surface interactions for the case of a corrugated surface. We discuss the issues that arise when the surface is corrugated on relatively small length scales (our best measurements on SiO2 yield a correlation length of 8–10 nm). We develop a continuum model that explicitly accounts for a

• 0.26 nm to the surface). The limits on wa–s carry over directly into limits on Wt–s, as we only integrate the tip potential where the integrand is defined. Thus within our continuum model with a perfectly rigid tip and substrate, we cannot generally take the tip into the regime in which the overall